DRK8090 Photoelectric Profiler

This instrument adopts non-contact, optical phase-shifting interferometric measurement method, does not damage the surface of the workpiece during measurement, can quickly measure the three-dimensional graphics of the surface micro-topography of various workpieces, and analyze and calculate the measurement results.

Product Description
Features: Suitable for measuring the surface roughness of various gauge blocks and optical parts; the depth of the reticle of the ruler and the dial; the thickness of the coating of the grating groove structure and the structure morphology of the coating boundary; the surface of the magnetic (optical) disk and the magnetic head Structure measurement; silicon wafer surface roughness and pattern structure measurement, etc.
Due to the high measurement accuracy of the instrument, it has the characteristics of non-contact and three-dimensional measurement, and adopts computer control and rapid analysis and calculation of measurement results. This instrument is suitable for all levels of testing and measurement research units, industrial and mining enterprise measurement rooms, precision processing workshops, and also suitable for Institutions of higher learning and scientific research institutions, etc.
The main technical parameters
Measuring range of surface microscopic unevenness depth
On a continuous surface, when there is no height abrupt change greater than 1/4 wavelength between two adjacent pixels: 1000-1nm
When there is a height mutation greater than 1/4 of the wavelength between two adjacent pixels: 130-1nm
Repeatability of measurement: δRa ≤0.5nm
Objective lens magnification: 40X
Numerical aperture: Φ 65
Working distance: 0.5mm
Instrument field of view Visual: Φ0.25mm
Photograph: 0.13×0.13mm
Instrument magnification Visual: 500×
Photograph (observed by computer screen)-2500×
Receiver measurement array: 1000X1000
Pixel size: 5.2×5.2µm
Measurement time sampling (scanning) time: 1S
Instrument standard mirror reflectivity (high): ～50%
Reflectance (low): ～4%
Lighting source: incandescent lamp 6V 5W
Green interference filter wavelength: λ≒530nm
Half width λ≒10nm
Main microscope lift: 110 mm
Table lift: 5 mm
Range of movement in X and Y direction: ～10 mm
Rotational range of worktable: 360°
Tilt range of working table: ±6°
Computer system: P4, 2.8G or more, 17-inch flat-screen display with 1G or more memory